Precise, accurate and repeatable Flow Control is used to measure and control many fluids within the semiconductor process. This includes chemical vapor deposition and plasma etch.
![Mass Flow Meters and Controllers](/images/ww/product/_resized/Brooks-GF-Series_hex_288_332_172_0_2333_2500.jpg)
Mass Flow Meters and Controllers
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Orders & Support: +44 (0) 1543 500 044
Orders & Support: +44 (0) 1543 500 044
Precise, accurate and repeatable Flow Control is used to measure and control many fluids within the semiconductor process. This includes chemical vapor deposition and plasma etch.